The At-Wavelength Metrology Facility at BESSY-II

Franz Schäfers, Andrey Sokolov

Abstract


The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM) equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.

References


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Schäfers, F., Bischff, P., Eggenstein, F., Erko, A., Gaupp, A., Künstner, S., . . . Zeschke, T. (2016). The atwavelength metrology facility for UV- and XUV-reflection and dffraction optics at BESSY-II. Journal of Synchrotron Radiation, 23(1), 67–77. http://dx.doi.org/10.1107/S1600577515020615

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Cite article as: Helmholtz-Zentrum Berlin für Materialien und Energie et al. (2016). The At-Wavelength Metrology Facility at BESSY-II. Journal of large-scale research facilities, 2, A50. http://dx.doi.org/10.17815/jlsrf-2-72




DOI: http://dx.doi.org/10.17815/jlsrf-2-72

URN: http://nbn-resolving.de/urn:nbn:de:0001-jlsrf-2-72-4

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