FEI Helios NanoLab 400S FIB-SEM
The FEI Helios NanoLab400S FIB-SEM is one of the world's most advanced DualBeamTM focused ion beam (FIB) platforms for transmission electron microscopy (TEM) sample preparation, scanning electron microscopy (SEM) imaging and analysis in semiconductor failure analysis, process development and process control. The FEI Helios NanoLab400S FIB-SEM combines an ElstarTM electron column for high-resolution and high-contrast imaging with a high-performance SidewinderM ion column for fast and precise cross sectioning. The FEI Helios NanoLab M 400S is optimised for high throughput high-resolution S/TEM sample preparation, SEM imaging and energy dispersive X-ray analysis. Its exclusive FlipStageTM and in situ STEM detector can flip from sample preparation to STEM imaging in seconds without breaking vacuum or exposing the sample to the environment. Platinum gas chemistry is the preferred metal deposition when a high deposition rate and precision of the deposition are required. Carbon deposition can be chosen as well. The system additionally allows for spatially resolved compositional analysis using the attached EDAX Genesis XM 4i X-ray microanalysis system.
Cite article as: Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons (ER-C) et al. (2016). FEI Helios NanoLab 400S FIB-SEM. Journal of large-scale research facilities, 2, A60. http://dx.doi.org/10.17815/jlsrf-2-106
Copyright (c) 2016 Journal of large-scale research facilities JLSRF
This work is licensed under a Creative Commons Attribution 4.0 International License.
Submission of an article authorizes Forschungszentrum Jülich to publish the accepted version of the article under a CC BY 4.0 Creative Commons Licence Creative Commons-Lizenz CC-BY 4.0. No article processing charges or submission fees are involved.